The preparation of metal film and its characteristics already is the microelectronics and materials science as an important issue.This thesis mainly discusses the sputtering film coating principle,principle of the growth of thin films,and its physical experiment in dynamic monitoring in the growth of thin films is technology.Also explores the related experimental teaching equipment design,the construction of the circuit,the experiment condition get,etc.The sputtering film coating and the growth of thin films is applied to the dynamic monitoring general physics experiment,is a major innovation,especially in the teaching can play an important role,can better that we master the knowledge,and can deepen the application.Along with the development of coating technology,this topic is there are a lot of subsequent research work.
英语翻译金属薄膜的制备和其特性的研究已是当今微电子和材料科学的重要课题.本论文主要论述了溅射镀膜原理,薄膜生长原理,及其
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